An electrodeposition process of copper under a laser beam was studied by using a rotating disk electrode. A laser beam results in local temperature rise at the electrode-soln. interface, this leads to: local pos. shift of rest potential, increase in exchange current i0 and charge transfer coefficient a, and strong microstirring which raises the limiting c.d. All these changes enhance electrodeposition rates, thus high-speed selective electroplating can be reached.

Key words: COPPER, ELECTRO-DEPOSITION, LASER RADIATION, ELECTRODE REACTION