Acta Chimica Sinica ›› 2002, Vol. 60 ›› Issue (11): 1946-1950. Previous Articles     Next Articles

Original Articles

氯离子对铜在玻碳电极上电结晶的影响

辜敏;杨防祖;黄令;姚士冰;周绍民   

  1. 汕头大学化学系,汕头(515063);厦门大学化学系,厦门(361005)
  • 发布日期:2002-11-15

Effect of Chloride Ion on Electrocrystallization of Copper on Glass Carbon Electrode

Gu Min;Yang Fangzu;Huang Ling;Yao Shibing;Zhou Shaomin   

  1. Department of Chemistry, Shantou University,Shantou(515063)
  • Published:2002-11-15

The initial stage of copper electrodeposition and the influence of chloride ions on the nucleation and growth of copper on galss carbon from acid sulphate solution were studied by using the cyclic voltammetry and the chronoamperometry method. Instantaneous nucleation with three-dimensional growth is found for the solutions either with or without chloride. Obviously, chloride ions increase the nucleation rate and the nuclear number density of nuclei at the surface. Since the deposits are smooth, bright at high nuclear number densities, it can be concluded that chloride ions effectively promote the smooth and brightness of surface. The higher nuclear number densities are obtained at 10~20 mg·L~(-1) of chloride ions. Maintaining the optimum level chloride ion concentration is beneficial to electrodeposits.

Key words: COPPER, CHLORINE ION, GLASS, ELECTROCRYSTALLIZATION, CRYSTAL NUCLEON, VOLTAMMETRY

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