Continuous mesoporous silica thin films with three-dimensional (3D) accessible pore structures have been prepared by a dip-coating technique using F-127 surfactants in nonaqueous media under acidic conditions, and can be grown on ITO. Films are shown to be crystalline. XRD study displays that the mesoporous film is SBA-16 with Im3m space group symmetry, and SBA-16 film with unit cell parameter a of 18.6 nm for calcined SBA-16 film, and the mesoporous openings about 7～8 nm. Adding a little of AlCl₃ into mother liquor of SBA-16, or the surface of ITO with RSiX₃, would enhance the integrity of SBA-16 film but did not change the structure of SBA-16 film. The results of FTIR indicate that there was a little —OH or crystal H₂O on the surface of SBA-16 film, the stability of SBA-16 film was good. The result of XPS demonstrates that, adding a little of MnCl₂ into SBA-16 film, the electricity of modified SBA-16 was improved.

Key words: mesoporous silica, modified SBA-16 film, pore structure