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Acta Chimica Sinica ›› 2009, Vol. 67 ›› Issue (7): 618-622. Previous Articles     Next Articles

Original Articles

聚天冬氨酸与钨酸钠复配对黄铜缓蚀作用的光电化学研究

徐群杰*,a 单贞华a 朱律均b 曹为民b 周国定a

  

  1. (a上海高校电力腐蚀控制与应用电化学重点实验室 上海电力学院 上海 200090)
    (b上海大学化学系 上海 200444)

  • 投稿日期:2008-06-13 修回日期:2008-09-28 发布日期:2009-04-14
  • 通讯作者: 徐群杰

Photoelectrochemical Study on the Complex of Poly-aspartate and Tungstate as Inhibitors against Brass Corrosion

Xu, Qunjie *,a Shan, Zhenhua a Zhu, Lüjun b Cao, Weimin b Zhou, Guoding a   

  1. (a Key Laboratory of Shanghai Institutes and Universities for Electric Power Corrosion Control and
    Applied Electrochemistry, Shanghai University of Electric Power, Shanghai 200090)
    (b Department of Chemistry, Shanghai University, Shanghai 200444)

  • Received:2008-06-13 Revised:2008-09-28 Published:2009-04-14

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Photoelectrochemical and electrochemical impedance measurements were conducted to study the effects of environment-friendly inhibitors poly-aspartate (PASP), Na2WO4 and their complexes on the corrosion of brass in a borax-buffer solution. The photoelectrochemical measurement results indicated that PASP or Na2WO4 increased the p-type photocurrent, which came from the Cu2O layer on the brass surface. It showed that the inhibitors increased the thickness of the Cu2O layer and decreased the corrosion rate. The optimal concentrations of PASP and Na2WO4 were 20 and 25 mg•L－1, respectively, and mono Na2WO4 increased much photocurrent than mono PASP did. Combining PASP and Na2WO4 at a total concentration of 20 mg•L－1, when the mass ratio (PASP∶Na2WO4) was 1∶1, the photocurrent increased more than that using the individual. The bigger the photocurrent was, the better the inhibition efficiency was.

Key words: brass, sodium tungstate, poly-aspartate, photoelectrochemistry, corrosion