The calculation of  surface atomic layer distances of chemisorption chalcogen on Ni(001) surface by low-energy-electron diffraction

Acta Chimica Sinica ›› 1989, Vol. 47 ›› Issue (2): 112-120. Previous Articles Next Articles

Original Articles

用低能电子衍射计算Ni(001)表面化学吸附氧族元素的表面原子层间距

蓝田;徐飞岳

成都电讯工程学院微电子技术与电子材料系

发布日期:1989-02-15

The calculation of surface atomic layer distances of chemisorption chalcogen on Ni(001) surface by low-energy-electron diffraction

LAN TIAN;XU FEIYUE

Published:1989-02-15

Abstract

The surface atomic layer distances dX (X = O, S, Se, Te) of chemisorbed chalcogens on Ni(001) surface was calculated by using one-dimensional band theory. The calculated LEED spectra are in very good agreement with the experimental results, when the surface atomic layer distances dO = 0.875 ?0.005, dS = 1.29 ?0.01, ds = 1.44 ?0.01, and dTe = 1.93 ?0.01 ?

Key words: NICKEL, CHEMICAL ADSORPTION, SURFACE CHEMISTRY, ELECTRON DIFFRACTION, INTERATOMIC DISTANCE, GROUP ELEMENT VIA

CLC Number:

O647
O641

Cite this article

LAN TIAN;XU FEIYUE. The calculation of surface atomic layer distances of chemisorption chalcogen on Ni(001) surface by low-energy-electron diffraction[J]. Acta Chimica Sinica, 1989, 47(2): 112-120.

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用低能电子衍射计算Ni(001)表面化学吸附氧族元素的表面原子层间距

The calculation of surface atomic layer distances of chemisorption chalcogen on Ni(001) surface by low-energy-electron diffraction

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