Study on the electronic structure of (Ti, Ni)/(0001)Al~2O~3 interfaces by XPS

Acta Chimica Sinica ›› 1996, Vol. 54 ›› Issue (9): 888-892. Previous Articles Next Articles

Original Articles

金属(Ti, Ni)/(0001)Al~2O~3界面电子结构的光电子能谱研究

刘韩星;张汉林;任海兰;欧阳世翕;王典芬

武汉工业大学新材料研究所;武汉工业大学测试中心

发布日期:1996-09-15

Study on the electronic structure of (Ti, Ni)/(0001)Al~2O~3 interfaces by XPS

LIU HANXING;ZHANG HANLIN;REN HAILAN;OUYANG SHIXI;WANG DIANFEN

Published:1996-09-15

Abstract

CLC Number:

O647

Cite this article

LIU HANXING;ZHANG HANLIN;REN HAILAN;OUYANG SHIXI;WANG DIANFEN. Study on the electronic structure of (Ti, Ni)/(0001)Al~2O~3 interfaces by XPS[J]. Acta Chimica Sinica, 1996, 54(9): 888-892.

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金属(Ti, Ni)/(0001)Al~2O~3界面电子结构的光电子能谱研究

Study on the electronic structure of (Ti, Ni)/(0001)Al~2O~3 interfaces by XPS

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