Acta Chimica Sinica ›› 2007, Vol. 65 ›› Issue (5): 465-469. Previous Articles     Next Articles

Reports

新型三硅氧烷表面活性剂在低能表面的铺展机理

张越1, 张高勇*,1,2, 韩富3   

  1. (1山西大学化学与化工学院 太原 030006)
    (2中国日用化学研究院 太原 030001)
    (3北京工商大学化学与环境工程学院 北京 100037)
  • 投稿日期:2006-03-21 修回日期:2006-10-08 发布日期:2007-03-14
  • 通讯作者: 张高勇

Spreading Mechanism of New Glucosamide-based Trisiloxane Surfactant on Low-Energy Surface

ZHANG Yue1; ZHANG Gao-Yong*,1,2; HAN Fu3   

  1. (1 College of Chemistry and Chemical Engineering, Shanxi University, Taiyuan 030006)
    (2 China Research Institute of Daily Chemical Industry, Taiyuan 030001)
    (3 College of Chemical and Environmental Engineering, Beijing Technology and Business University, Beijing 100037)
  • Received:2006-03-21 Revised:2006-10-08 Published:2007-03-14
  • Contact: ZHANG Gao-Yong

In order to find the mechanism for spreading and superspreading behavior of trisiloxane surfactant on low-energy surface, the time-dependent and the concentration-dependent spreading performances of five new gulcosamide-based trisiloxane on paraffin wax surface were investigated. The results showed that: in most cases, the spreading of these surfactants was driven by the unbalanced capillary force on the three-phase contact line, and that surface tension gradient participated the spreading process of surfactant I, II with higher concentration. Moreover, the spreading performance was affected by the HLB values and molecular volume of surfactant. Surfactant II with modest HLB value showed the best spreading performance within all concentrations, which also showed some superspreading behavior on paraffin wax surface.

Key words: trisiloxane, glucosamide, spreading, low-energy surface, superspreading