Metallization processes of DNA have been developing quickly, and DNA-templated construction of nanowires provides a possibility of the combination of biology and micro/nano fabrication. In this article, the traditional DNA elongating and metallization process was improved by the use of semiconductor material—silicon as the sample substrate. The good linear DNA was achieved by tilted elongation method. The novel metallization process proves to be a good method for fabrication of metal nanowires and nano networks on DNA. With the accomplishment of difficult nano-patterns by DNA construction, sequential metallization can be carried out and nano integrate circuits constructed in the future.

Key words: DNA metallization, elongated alignment, Parafilm, metal nanowire