化学学报 ›› 2004, Vol. 62 ›› Issue (5): 527-531. 上一篇    下一篇

研究简报

一种新型香豆素酮可见光敏化染料的合成及其光引发性质的研究

王涛, 吴飞鹏, 施盟泉, 高放, 杨永源   

  1. 中国科学院理化技术研究所, 北京, 100101
  • 投稿日期:2003-07-01 修回日期:2003-10-27 发布日期:2014-02-18
  • 通讯作者: 吴飞鹏,E-mail:fpwu@mail.ipc.ac.cn;g208@ipc.ac.cn E-mail:fpwu@mail.ipc.ac.cn;g208@ipc.ac.cn
  • 基金资助:
    国家自然科学基金(No.50173031)和国家重点基础研究发展规划(No.G1999033004)资助项目.

Synthesis of a Novel Ketocoumarin Visible-Light Photosensitive Dye and Its Initiating Properties

WANG Tao, WU Fei-Peng, SHI Meng-Quan, GAO Fang, YANG Yong-Yuan   

  1. Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100101
  • Received:2003-07-01 Revised:2003-10-27 Published:2014-02-18

高效的可见光光敏引发体系是目前光聚合研究中的重要领域.3,3′-二(7-二乙胺基)香豆素酮(R)已被公认为一种高效的可见光聚合敏化染料,并可以与Ar+激光488 nm波长匹配.本文新合成了一种染料3-(4-二乙胺基-苯丙烯酰基)-7-二乙胺基香豆素(S).实验发现在普通碘钨灯照射下,S/邻氯六芳基双咪唑(HABI)体系具有比已有高效染料R/HABI体系更快的光漂白速度和更高的引发聚合效率,是一种新型高效的可见光光敏聚合引发体系.而且S在不同溶剂中的最大吸收波长在452~489 nm之间,比R红移16~30 nm,因此该体系可以更好地与Ar+ (488 nm)激光器匹配.本文对该染料的光敏化机理进行了探讨.

关键词: 光聚合, 光漂白, 三线态敏化, 香豆素, 引发剂

The development of visible-light photosensitive initiating systems has become an important subject of photopolymerization. 3,3′-bis(7-diethylamino)coumarin ketone (R) has been proved to be an efficient sensitizer, and it could match with the Ar+ laser at 488 nm. In this paper, a novel ketocoumarin dye (S) was prepared by the condensation of 3-acetyl-7-diethylaminocoumarin with 4-diethylaminobenzaldehyde. Photopolymerization initiating systems composed of the dyes and radical source of hexaarylbisimidazoles (HABI) were produced. The experimental results showed that the photobleaching rate of S/HABI was much faster than that of R/HABI, and S/HABI system also exhibited higher initiating efficiency than R/HABI for the photopolymerization of 2-phenoxyethyl acrylate (POEA)/N-vinyl carbazole (NVC). It was found that the maximum absorption wavelength of S ranging from 452 to 489 nm is about 16~30 nm red-shift more than that of R in the corresponding solvent. All these facts proved that the S/HABI visible light photosensitive system is more efficient and suitable for Ar+ laser than R/HABI. The sensitization mechanism of S/HABI system was also discussed.

Key words: photosensitive photopolymerization, photobleaching, triplet sensitization, coumarin, initiator