Acta Chimica Sinica ›› 1995, Vol. 53 ›› Issue (5): 417-424.     Next Articles

Original Articles

n^+-Si在HF溶液中的阳极极化行为和阻抗谱

贾瑞宝;王士勋;李国铮   

  1. 山东大学化学系
  • 发布日期:1995-05-15

Anodic polarization behavior and impedance response of n^+-Si in hydrofluoric acid solution

JIA RUIBAO;WANG SHIXUN;LI GUOZHAENG   

  • Published:1995-05-15

The voltammetric curves of heavily doped n-Si(n^+-Si) closely related to the concentration of HF solution and the irradiation were investigated. There are generally three regions on each i-φ curve: porous silicon formation at low potentials, electropolishing at high potentials and a transition region located in between. The corresponding complex plane impedance plots of n^+-Si at above three potential regions is dependent on the potential and light illumintion. The influence of the illumination on the impendance were measured and discussed.

Key words: POLISHING, SEMICONDUCTOR, PHOTO-ELECTROCHEMISTRY, POROUS SILICON, ANODIC POLARIZATION

CLC Number: