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化学学报
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化学学报 ›› 1963, Vol. 29 ›› Issue (6): 395-402. 上一篇    下一篇

论文

金属离子水解沉淀反应的隐蔽Ⅱ.鉍及氧鋯离子的隐蔽

王夔   

  1. 北京医学院药学系
  • 投稿日期:1962-09-01 发布日期:2013-06-03

THE MASKING OF HYDROLYTIC PRECIPITATION REACTIONS OF METALLIC IONS Ⅱ. THE MASKING OF BISMUTH AND ZIRCONYL IONS

WANG K'UEI   

  1. Department of Pharmacy, Peking Medical College
  • Received:1962-09-01 Published:2013-06-03

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用pH滴定法研究了在各种隐蔽剂存在下,鉍及氧鈷离子开始发生水解沉淀的pH值。由所得結果得到隐蔽鉍离子水解的能力順序为隣苯二酚二磺酸>酒石酸、半胱氨酸>柠檬酸>乙二胺四乙酸>二巯基丙醇>磺基水楊酸>硫代硫酸鈉>碘化鉀>硫脲>硫氰酸鉀。而隐蔽氧锆离子的順序为隣苯二酚二磺酸>柠檬酸>酒石酸>乙二胺四乙酸>苹果酸>磺基水楊酸>碳酸鈉>氟化鈉、隣苯二酚、肌醇>水楊酸鈉、半胱氨酸>草酸。

The relative masking abilities toward the hydrolytic precipitation of bismuth and zirconyl ions of some complexing agents were studied by means of pH titration method.Based on the experimental results,the sequences of the masking effect are obtained as following: for bismuth ions,pyrocatecholdisulphonic acid>tartaric acid,cystein > citric acid > ethylenediaminetetraacetic acid > dimercaptopropanol > sulphosalicylic acid > sodium thiosulphate > potassium iodide > thiourea > potassium thiocyanate; for zirconylions,pyrocatecholdisulphonic acid > citric acid > tartaric acid > ethylenediaminetetraacetic acid > malic acid > sulphosalicylic acid > sodium carbonate > sodium fluoride,pyrocatechol,inositol>sodium salicylate,cystein> oxalic acid.