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化学学报
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化学学报 ›› 2004, Vol. 62 ›› Issue (21): 2187-2190. 上一篇    下一篇

研究论文

重氮树脂单层膜上铜的无电沉积

张茂峰, 杨朝晖, 丛海林, 曹维孝   

  1. 北京大学化学与分子工程学院, 北京, 100871
  • 投稿日期:2004-01-12 修回日期:2004-04-20 发布日期:2014-02-17
  • 通讯作者: wxcao@pku.edu.cn
  • 作者简介:曹维孝,E-mail:wxcao@pku.edu.cn
  • 基金资助:
    国家自然科学基金(No.50173002)资项目助.

Electroless Deposition of Cu on DR Monolayer

ZHANG Mao-Feng, YANG Zhao-Hui, CONG Hai-Lin, CAO Wei-Xiao   

  1. College of Chemistry and Molecular Engineering, Peking University, Beijing 100871
  • Received:2004-01-12 Revised:2004-04-20 Published:2014-02-17

PDF

598

被引次数

2

组装于硅片或玻璃片基片上的重氮树脂(DR)单层膜,吸附SnCl2,Pd催化剂后,通过无电沉积的方法,在这些基片上制备了铜膜.对得到的铜膜进行了SEM,XRD表征.通过选择性无电沉积,成功地制备了铜膜图像.

关键词: 重氮树脂, 无电沉积, 铜膜, 铜膜图像

The electroless deposition of copper on the monolayer film of diazoresin (DR), which was fabricated on the silicon or glass surface, was performed via absorbing SnCl2 and Pd on the DR film. The copper film was characterized with SEM and XRD showing that the electroless deposition of copper on the substrate is successful. Through the selective electroless deposition the Cu film pattern was obtained.

Key words: diazoresin, electroless deposition, Cu film, Cu film pattern