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化学学报
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化学学报 ›› 2007, Vol. 65 ›› Issue (7): 575-578. 上一篇    下一篇

研究论文

N,N-二甲基甲酰胺中电沉积制备镁镍储氢合金

张晓燕*, 刘卫红   

  1. (上海大学化学系 上海 200444)
  • 投稿日期:2006-09-21 修回日期:2006-11-04 发布日期:2007-04-14
  • 通讯作者: 张晓燕

Electrodeposition for the Preparation of Mg-Ni Hydrogen Storage Alloy in N,N-Dimethylformamide

ZHANG Xiao-Yan*; LIU Wei-Hong   

  1. (Chemistry Department, Shanghai University, Shanghai 200444)
  • Received:2006-09-21 Revised:2006-11-04 Published:2007-04-14

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采用恒电位沉积法, 选用适宜的添加剂和络合剂, 成功地从N,N-二甲基甲酰胺(DMF)中沉积出致密的黑色Mg-Ni储氢合金膜. 并初步探讨了其共沉积机理. XRD显示沉积层中含有非晶态Mg-Ni相和微晶态Mg相. SEM图及相应能谱图分析表明合金颗粒以团聚状态存在, 合金成分不是很均匀. AAS分析表明沉积合金中Mg的原子摩尔分数达27.3%. LAND电池测试系统测得所镀合金膜的放电比容量最高为172.4 mAh/g.

关键词: Mg-Ni合金, 储氢合金, 电沉积, N,N-二甲基甲酰胺

Smooth and uniform black Mg-Ni hydrogen storage alloy films are successfully electrodeposited from N,N-dimethylformamide (DMF) solution with proper complexing agent and additive agent at potentiostatic electrolysis. And the mechanism of co-deposition is discussed. XRD results show that there is amorphous Mg-Ni phase and microcrystalline Mg phase in the electrodeposits. SEM images of the deposit and the EDS analysis show that grains of the alloy exist as glomeration. AAS analysis indicates that the molar fraction of Mg is up to 27.3%, and the maximum discharge specific capacity of the deposit is up to 172.4 mAh/g.

Key words: Mg-Ni alloy, hydrogen storage alloy, electrodeposition, N,N-dimethylformamide