疏水性有序介孔氧化硅薄膜的制备

化学学报 ›› 2011, Vol. 69 ›› Issue (06): 659-665. 上一篇下一篇

研究论文

疏水性有序介孔氧化硅薄膜的制备

彭迟香¹，吴国友¹，余煜玺*^{,1,2，程璇*^,1,2}

(¹厦门大学材料学院材料科学与工程系厦门 361005)
(²特种先进材料福建省重点实验室厦门 361005)

投稿日期:2010-05-19 修回日期:2010-09-05 发布日期:2010-10-21
通讯作者: 程璇 E-mail:pengchixiang@xmu.edu.cn
基金资助:
福建省自然科学基金

Synthesis of Hydrophobic Ordered Mesoporous Silica Films

Peng Chixiang¹ Wu Guoyou¹ Yu Yuxi*^{,1,2 Cheng Xuan*^,1,2}

(¹ Department of Materials Science and Engineering, College of Materials, Xiamen University, Xiamen 361005) (² Fujian Key Laboratory of Advanced Materials, Xiamen 361005)

Received:2010-05-19 Revised:2010-09-05 Published:2010-10-21
Contact: Xuan Cheng E-mail:pengchixiang@xmu.edu.cn

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摘要/Abstract

采用溶胶−凝胶技术并结合蒸发诱导自组装工艺, 以三嵌段共聚物EO₂₀PO₇₀EO₂₀ (P123)为模板剂, 使用浸渍提拉法制备了有序介孔氧化硅薄膜, 并使用不同的表面修饰剂对薄膜进行表面处理, 制备了疏水性有序介孔氧化硅薄膜. 利用FT-IR、小角XRD、HRTEM分别表征薄膜的化学物种和孔结构, 探讨了热处理温度和老化时间对薄膜介孔结构的影响, 通过接触角测试研究薄膜的疏水性能, 考察了修饰剂种类、修饰浓度和修饰时间对薄膜疏水性的影响, 结果表明所制备的薄膜为高度有序的介孔氧化硅薄膜, 孔径大小约为8 nm|表面修饰对薄膜的有序性有一定影响, 经三甲基氯硅烷(TMCS)和g-氨丙基三乙氧基硅烷(KH-550)修饰后的薄膜具有很好的疏水性能, 接触角分别为112°和96°|修饰后薄膜的水汽稳定性良好, 仍能保持有序介孔结构, 孔径达7.5 nm, 接触角达93°.

关键词: 有序介孔, 氧化硅薄膜, 表面修饰

Mesoporous silica films were synthesized by sol-gel process combined with evaporation-induced self-assembly (EISA) process using block copolymer EO₂₀PO₇₀EO₂₀ (P123) as a template. The films were deposited on glass substrates by dip-coating method and were characterized by Fourier transform infrared (FT-IR) spectroscopy, small-angle X-ray diffraction (SAXD) spectroscopy, and high resolution transmission electron microscopy (HRTEM). The effects of heat treatment temperature and aging time on the micro- structure of mesoporous silica films were investigated. The surface modifications of silica films with different concentrations, aging time and temperatures were studied using trimethylchlorosilane (TMCS), g-amino- propyltriethoxysilane (KH-550) and polymethyl triethoxy silane (PTS). The results showed that the high degree orders of meosporous silica thin films with the pore sizes of 8 nm were obtained and the highly ordered mesoporous structures were slightly changed after the surface modification. The surfaces of films after modified with TMCS and KH-550 became hydrophobic. The contact angles of the thin films modified with TMCS and KH-550 were 112° and 96°, respectively. Furthermore, the modified thin films exhibited good moisture stability. The ordered mesoporous structure remained unchanged with the contact angle of 93°.

Key words: ordered mesoporous, silica films, surface modification

中图分类号:

TB32

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彭迟香, 吴国友, 余煜玺, 程璇. 疏水性有序介孔氧化硅薄膜的制备[J]. 化学学报, 2011, 69(06): 659-665.

PENG Chi-Xiang, WU Guo-You, YU Yu-Xi, CHENG Xuan. Synthesis of Hydrophobic Ordered Mesoporous Silica Films[J]. Acta Chimica Sinica, 2011, 69(06): 659-665.

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疏水性有序介孔氧化硅薄膜的制备

Synthesis of Hydrophobic Ordered Mesoporous Silica Films

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