以香豆素二硫化物(C-S-S-C)/三丁基膦复合体系为链转移剂、甲基丙烯酸-N,N-二甲氨基乙酯(DMAEMA)为单体、偶氮二异丁腈(AIBN)为引发剂制备了末端为香豆素光响应基元的双亲性遥爪聚合物(C-PDMAEMA). 用FTIR, GPC, ¹H NMR等对该聚合物进行了结构表征. 研究表明该遥爪聚合物可直接在水中形成纳米聚集体|且其香豆素端基可在365 和254 nm交替光照下进行可逆光二聚反应. 同时纳米粒度跟踪(Malvern Zetasizer Nano-ZS)、透射电镜(TEM)跟踪结果表明, 随香豆素端基光二聚反应的进行, 聚合物纳米聚集体的粒径逐渐增大|反之, 随着光解二聚反应的进行, 该纳米聚集体的粒径逐渐减小.

A novel photo-sensitive telechelic poly(N,N-dimethylaminoethyl methacrylate) with coumarin end (C-PDMAEMA) was prepared with DAMEMA as monomer, coumarin-containing disulfide (C-S-S-C) as a chain transfer agent in the presence of Bu₃P and water, AIBN as initiator. The polymer was characterized with ¹H NMR, GPC and FTIR spectroscopes. It was found that the polymer can immediately form polymer nano-aggregate in aqueous solution. And the coumarin end group of the polymer can be reversibly photo-dimerized upon 365 and 254 nm irradiation. The hydrodynamic size analysis determined by Malvern Zetasizer Nano-ZS instrument and the TEM observations showed that the average size of the polymer nano-aggregate increased upon 365 nm irradition and decreased upon the subsequent 254 nm light.