采用电沉积法,在阳极氧化铝(AAO)模板中制备了[NiFe/Cu/Co/Cu]n多层纳米线.利用扫描电子显微镜(SEM)及透射电子显微镜(TEM)对纳米多层线的表面形貌及结构进行了表征,纳米线阵列高度有序、直径均一、层状结构清晰,NiFe层厚度约40 nm,Cu层厚度约60 nm,Co层厚度约15 nm,各子层厚度可控.利用X射线能谱分析仪(EDS)对纳米多层线NiFe层的成分进行了测试,Ni,Fe的原子比为4:1.利用X射线衍射仪(XRD)对[NiFe/Cu/Co/Cu]n纳米多层膜和多层线结构进行了测试,多层膜为面心立方(fcc)结构,多层线NiFe层为面心立方(fcc)结构,Cu层为六方密排hcp(100),Co层为面心立方(fcc)结构.与组成、结构完全相同的多层膜相比,[NiFe/Cu/Co/Cu]n多层纳米线具有更优越的巨磁电阻性能.
张卫国
,
谢仁鑫
,
王宏智
,
姚素薇
. [NiFe/Cu/Co/Cu]n纳米多层线的电化学制备及表征[J]. 化学学报, 2012
, 70(01)
: 1
-5
.
DOI: 10.6023/A1106191
[NiFe/Cu/Co/Cu]n multilayered nanowires was electrodeposited into the pores of an anodic alu-minum oxide(AAO)template by the union of single bath and dual bath method.Scanning electronic mi-croscopy(SEM)and transmission electron microscopy(TEM)were used to characterize the morphology andmultilayered structure of multilayered nanowires.The results show that the layer thicknesses are very uni-form and the multilayered structure is clear and regular.The thickness of NiFe,Cu and Co segment is about40,60 and 15 nm respectively.The multilayered nanowires array is highly ordered.Energy dispersive X-rayspectroscopy(EDS)was used to characterize the components of multilayered nanowires.The results showthat the atomic ratio of Ni to Fe is 4:1.X-ray diffraction was used to characterize the structure of multilay-ered films and multilayered nanowires.The results show that multilayered films is face-centered-cubic(fcc),NiFe layer of multilayered nanowires is face-centered-cubic(fcc),Cu layer is hexagonal closed-packedhcp(100),Co layer is face-centered-cubic(fcc).With the same composition and structure,[NiFe/Cu/Co/Cu]nmultilayered nanowires has a more superior performance of giant magnetoresistance than multilayered films.
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