研究论文

单轴应变对石墨烯掺杂硼、氮、铝、硅、磷的影响与调控

  • 吴其胜 ,
  • 王子路 ,
  • 王金兰
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  • 东南大学物理系 南京 211189

收稿日期: 2014-09-24

  网络出版日期: 2014-11-17

基金资助

项目受973计划(Nos.2010CB923401,2011CB302004)、国家自然科学基金(Nos.21173040,21373045)和江苏省自然科学基金(No.BK20130016)资助.

Strain Engineered Modulation on Graphene Doped with Boron, Nitrogen, Aluminum, Silicon and Phosphorus

  • Wu Qisheng ,
  • Wang Zilu ,
  • Wang Jinlan
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  • Department of Physics, Southeast University, Nanjing 211189

Received date: 2014-09-24

  Online published: 2014-11-17

Supported by

Project supported by the National Basic Research Program of China (Nos. 2010CB923401, 2011CB302004), the National Natural Science Foundation of China (Nos. 21173040, 21373045) and the Natural Science Foundation of Jiangsu Province (No. BK20130016) in China.

摘要

掺杂石墨烯因对石墨烯的性质有良好的修饰作用而备受关注. 掺杂石墨烯的实验合成一直都是研究热点, 但有一个普遍的难题, 就是掺杂困难, 掺杂浓度不高. 针对这一难题, 我们提出了通过对石墨烯施加单轴应变来降低掺杂过程反应形成能, 从而实现石墨烯的有效可控掺杂的可能性. 我们的第一性原理计算结果表明, 在施加应变时, 拉伸应变有利于硼掺杂, 而压缩应变使氮掺杂更容易, 对于铝、硅、磷, 不管是拉伸还是压缩均可以使掺杂更容易. 此外, 我们还进一步揭示了单轴应变对掺杂石墨烯的电子结构及磁性质的影响规律.

本文引用格式

吴其胜 , 王子路 , 王金兰 . 单轴应变对石墨烯掺杂硼、氮、铝、硅、磷的影响与调控[J]. 化学学报, 2014 , 72(12) : 1233 -1237 . DOI: 10.6023/A14090660

Abstract

Doped graphene has been widely focused because of its modifications on properties of graphene. Syntheses of doped graphene have been hotspots for years and experimentalists are still struggling for obtaining controllable high-quality doped graphene. Usually, rigorous experimental conditions are required. In order to make it easier to dope impurities into graphene, we proposed that uniaxial strain can reduce the formation energy of the process of doping graphene. By using first-principles calculations, we first calculated the formation energy of doping graphene with boron, nitrogen, aluminum, silicon and phosphorus under different uniaxial strains (from -6% to 6%). After that, we studied the effect of uniaxial strain on the electronic structure and magnetism of doped graphene. The DFT calculations were carried out within the framework of plane-wave density functional theory, implemented in the Vienna ab initio simulation package (VASP). The projector-augmented-wave potentials were employed to describe the electron-ion interaction and the Perdew-Burke-Ernzerhof generalized gradient approximation (PBE-GGA) was used for exchange-correlation functional. The kinetic energy cutoff of 400 eV was adopted for the plane-wave expansion and the Brillouin zone was sampled by the Monkhorst-Pack scheme. Periodic boundary conditions were used in the simulations, and the graphene sheet was modeled by a rectangular supercell with 60 carbon atoms, indicating that the dosage concentration is 1.67%. We found that uniaxial strain can apparently change the formation energy of doping processes: tensile and compressive strain can reduce the formation energy of graphene doped with boron and nitrogen, respectively, while the formation energy of graphene doped with aluminum, silicon and phosphorus can be reduced by both tensile and compressive strain. The band gaps of doped graphene range from ca. 0.1 to 0.9 eV and can be changed by the uniaxial strain, which will reach a maximum under 3% tensile strain for all the dopant species. Boron-, nitrogen-, aluminum- and silicon-doped graphene are nonmagnetic. On the contrary, phosphorus-doped graphene is magnetic and its magnetic moment decreases under both tensile and compressive strain.

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