化学学报 ›› 1993, Vol. 51 ›› Issue (4): 341-345. 上一篇    下一篇

研究论文

激光增强电沉积铜过程的研究

王旭红;周焕钧;郁祖湛   

  1. 复旦大学化学系
  • 发布日期:1993-04-15

A study of laser-enhanced electrodeposition process of copper

WANG XUHONG;ZHOU HUANJUN;YU ZUZHAN   

  • Published:1993-04-15

用旋转圆盘电极法研究了激光照射下铜的电沉积过程。证明激光照射引起电极界面微区温度升高, 使平衡电位正移, 交换电流i~o和电荷传递系数α均增大, 剧烈的微区搅拌提高了极限扩散电流。这些变化都加快了电沉积速度, 使高速局部电镀有可能实现。

关键词: 铜, 电沉积, 激光辐照, 电极反应

An electrodeposition process of copper under a laser beam was studied by using a rotating disk electrode. A laser beam results in local temperature rise at the electrode-soln. interface, this leads to: local pos. shift of rest potential, increase in exchange current i0 and charge transfer coefficient a, and strong microstirring which raises the limiting c.d. All these changes enhance electrodeposition rates, thus high-speed selective electroplating can be reached.

Key words: COPPER, ELECTRO-DEPOSITION, LASER RADIATION, ELECTRODE REACTION

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