Reactions of thienyl containing trisilane under irradiation

Abstract

Photolysis of 2-phenyl-2-(2-thienyl)hexamethyltrisilane in MeOH/cyclohexene afforded radical reaction products. The sulfur atom of the thienyl group was suspected of stabilizing a silyl radical. The presence of trimethylsilyl(phenyl)(2-thienyl)silyl radical was supported by identification of its reaction products and by an ESR spectrum (no data) of its quenching product with 2-methyl-2-nitrosopropane.

Key words: FURAN P, QUENCHING, ELECTRON SPIN RESONANCE SPECTROMETRY, PHOTOLYSIS, SILANE, FREE RADICAL REACTION, ADDITION REACTION, INSERTION REACTION, THIOPHENE P

CLC Number:

O627

Cite this article

WU SHIHUI;QIAN HU;WU GE;JIANG NAN. Reactions of thienyl containing trisilane under irradiation[J]. Chin. J. Org. Chem., 1993, 13(3): 293-294.

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