化学学报 ›› 2012, Vol. 70 ›› Issue (12): 1371-1378.DOI: 10.6023/A1201191 上一篇    下一篇

研究论文

聚苯乙烯-聚甲基丙烯酸甲酯两嵌段共聚物薄膜在丙酮蒸汽退火下的形貌演化

潘忠诚, 彭娟   

  1. 聚合物分子工程国家重点实验室 复旦大学高分子科学系 上海 200433
  • 投稿日期:2012-01-19 修回日期:2012-03-26 发布日期:2012-03-29
  • 通讯作者: 彭娟 E-mail:juanpeng@fudan.edu.cn
  • 基金资助:

    国家自然科学基金(No. 20804011)和国家科技部(No. 2008AA032102)资助项目.

Morphologies in Acetone-Annealed Polystyrene-Poly(methyl methacrylate) Diblock Copolymer Thin Films

Pan Zhongcheng, Peng Juan   

  1. State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai 200433, China
  • Received:2012-01-19 Revised:2012-03-26 Published:2012-03-29
  • Supported by:

    This work was supported by the National Natural Science Foundation of China (No. 20804011) and the National High Technology Research and Development Program of China (No. 2008AA032102).

用敲击模式原子力显微镜研究了聚苯乙烯-聚甲基丙烯酸甲酯(PS-b-PMMA)两嵌段共聚物薄膜形貌在丙酮蒸汽退火下随时间的演化过程. 对于对称的嵌段共聚物薄膜(fPSfPMMA, fPS 为PS-b-PMMA 中PS 的体积分数, fPMMA 为PMMA 的体积分数), 通过控制膜厚和平衡态时相周期的比值可以使不同分子量的嵌段共聚物薄膜都实现由蠕虫状结构到孔洞再到条纹的形貌演化过程; 对于非对称的嵌段共聚物薄膜, 发现当聚苯乙烯组分含量较少(25%, 36%)时, 薄膜的形貌由无序态分别转变为规则排列的小球和直接转变为条纹结构; 而当聚苯乙烯组分含量较多(70%)时, 薄膜的形貌则由无序态转变为较平整的表面结构. 我们对不同形貌的形成机理进行了详细的讨论.

关键词: 两嵌段共聚物, 薄膜形貌, 丙酮蒸汽退火

The time development of morphologies and structures of symmetric and asymmetric polystyrene- b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer thin films after annealing in acetone vapor was investigated by tapping mode atomic force microscopy (AFM). Film thickness played an important role in the morphology evolution of symmetric PS-b-PMMA (fPSfPMMA, fPS is the volume fraction of the PS in PS-b-PMMA, fPMMA is the volume fraction of the PMMA) thin film. When film thickness was controlled according to their equilibrium bulk lamellar period, all the investigated thin films of PS-b-PMMA with different molecular weights can change from disordered pattern to nanoscale depression and at last to striped structures. In the case of asymmetric PS-b-PMMA systems, when the content of PS segment was low (25%, 36%), film morphology changed from disordered state to regularly packed spheres and directly to stripes, respectively; when the content of PS segment was high (70%), film morphology changed from disordered pattern to relatively flat state. The formation mechanisms of different film morphologies have been discussed in detail.

Key words: diblock copolymer, film morphology, acetone vapor annealing