Chinese Journal of Organic Chemistry ›› 2020, Vol. 40 ›› Issue (4): 873-885.DOI: 10.6023/cjoc201911009 Previous Articles     Next Articles


张慧苗a, 李灵芝a, 沈方旗b, 蔡涛a, 沈润溥a   

  1. a 绍兴文理学院化学化工学院 浙江绍兴 312000;
    b 西北师范大学化学化工学院 兰州 730070
  • 收稿日期:2019-11-06 修回日期:2019-12-04 发布日期:2019-12-19
  • 通讯作者: 蔡涛
  • 基金资助:

Recent Advance in the Transition-Metal-Catalyzed Carbene Insertion Reactionsof Si—H Bond

Zhang Huimiaoa, Li Lingzhia, Shen Fangqib, Cai Taoa, Shen Runpua   

  1. a College of Chemistry and Chemical Engineering, Shaoxing University, Shaoxing, Zhejiang 312000;
    b College of Chemistry and Chemical Engineering, Northwest Normal University, Lanzhou 730070
  • Received:2019-11-06 Revised:2019-12-04 Published:2019-12-19
  • Supported by:
    Project supported by the Youth Foud of Shaoxing University (No. 20185019).

Organosilicon compounds have been widely used in organic synthesis, biomedicine, material science and other fields. The development of simple and efficient C——Si bond construction methodology has attracted extensive attention from scientists. Transition-metal-catalyzed carbene insertion reaction of Si——H bond is one of the important methods to form C——Si bond. It not only has the advantages of simple operation, mild reaction conditions and high atom economy, but also can be used to synthesize various chiral organosilanes with high enantioselectivity through the regulation of chiral ligands. In recent years, achieved rapid development has been in this field, and various new carbene precursors and metal catalytic systems have been emerged. According to the group of transition metal elements, recent advance in the iron, copper, zinc, ruthenium, rhodium, palladium, silver, iridium and gold catalyzed carbene insertion reactions of Si——H bond since 2012 is reviewed in five parts.

Key words: transition metal catalysis, metal carbene, Si—H bond insertion, C—Si bond formation, organosilane