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化学学报
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化学学报 ›› 2011, Vol. 69 ›› Issue (10): 1186-1190. 上一篇    下一篇

研究论文

同轴三层纳米电缆NiO@SiO2@TiO2的制备与表征

宋超, 董相廷*, 王进贤, 刘桂霞   

  1. (长春理工大学化学与环境工程学院 长春 130022)
  • 投稿日期:2010-07-21 修回日期:2010-12-14 发布日期:2011-01-20
  • 通讯作者: 董相廷 E-mail:dongxiangting888@yahoo.com.cn
  • 基金资助:

    国家自然科学基金

Preparation and Characterization of NiO@SiO2@TiO2 Coaxial Trilayered Nanocables

SONG Chao, DONG Xiang-Ting, WANG Jin-Xian, LIU Gui-Xia   

  1. (School of Chemistry and Environmental Engineering, Changchun University of Science and Technology, Changchun 130022)
  • Received:2010-07-21 Revised:2010-12-14 Published:2011-01-20
  • Contact: XiangTing Dong E-mail:dongxiangting888@yahoo.com.cn

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采用静电纺丝技术, 通过改进实验装置, 成功地制备出了NiO@SiO2@TiO2同轴三层纳米电缆. 采用差热-热重(TG-DTA)分析、X射线衍射(XRD)分析、傅立叶变换红外光谱(FTIR)分析、扫描电子显微镜(SEM)分析和透射电子显微镜(TEM)等分析技术对样品进行表征, 结果表明, 所得产物为NiO@SiO2@TiO2同轴三层纳米电缆, 内层为NiO, 直径大约为40～50 nm|中间层为SiO2, 厚度大约为40～45 nm|外层为TiO2, 厚度大约为45～50 nm. 对NiO@SiO2@TiO2同轴三层纳米电缆的形成机理进行了讨论.

关键词: NiO@SiO2@TiO2, 同轴三层纳米电缆, 静电纺丝技术

NiO@SiO2@TiO2 coaxial trilayered nanocables were successfully fabricated through modified electrospinning equipment via electrospinning technique. The samples were characterized by thermogravimetric-differential thermal analysis (TG-DTA), X-ray diffractometry (XRD), Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Results showed that the obtained products are NiO@SiO2@TiO2 coaxial trilayered nanocables. The core layer is NiO, and its diameter is ca. 40～50 nm. The middle layer is SiO2, and its thickness is ca. 40～45 nm. The outer layer is TiO2 and the thickness is about 45～50 nm. Formation mechanism of NiO@SiO2@TiO2 coaxial trilayered nanocables was preliminarily proposed.

Key words: NiO@SiO2@TiO2, coaxial trilayered nanocable, electrospinning

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