Chin. J. Org. Chem. ›› 2015, Vol. 35 ›› Issue (6): 1375-1379.DOI: 10.6023/cjoc201412028 Previous Articles     Next Articles



孙京a, 彭新华a, 郭浩b   

  1. a 南京理工大学化工学院 南京 210094;
    b 复旦大学化学系 上海 200433
  • 收稿日期:2014-12-17 修回日期:2015-01-14 发布日期:2015-02-02
  • 通讯作者: 彭新华, 郭浩;
  • 基金资助:

    教育部高等学校博士学科点专项科研基金(No. 20110071120004)资助项目.

Studies on Photoinduced Carbon-Silicon Bond Cleavage and Subsequent Bromination Reaction

Sun Jinga, Peng Xinhuaa, Guo Haob   

  1. a School of Chemical Engineering, Nanjing University of Science and Technology, Nanjing 210094;
    b Department of Chemistry, Fudan University, Shanghai 200433
  • Received:2014-12-17 Revised:2015-01-14 Published:2015-02-02
  • Supported by:

    Project supported by the Specialized Research Fund for the Doctoral Program of Higher Education (No. 20110071120004).

A novel photoinduced bromination of benzylsilanes is reported. This reaction undergoes smoothly under UV irradiation at room temperature via two key steps: C—Si bond cleavage and subsequent bromination, which presents a new protocol to the synthesis of benzyl bromides. In addition, a possible mechanism of this reaction is proposed.

Key words: photochemistry, bromination, mechanism, radical reactions, organicsilanes