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化学学报
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化学学报 ›› 1996, Vol. 54 ›› Issue (9): 888-892. 上一篇    下一篇

研究论文

金属(Ti, Ni)/(0001)Al~2O~3界面电子结构的光电子能谱研究

刘韩星;张汉林;任海兰;欧阳世翕;王典芬   

  1. 武汉工业大学新材料研究所;武汉工业大学测试中心
  • 发布日期:1996-09-15

Study on the electronic structure of (Ti, Ni)/(0001)Al~2O~3 interfaces by XPS

LIU HANXING;ZHANG HANLIN;REN HAILAN;OUYANG SHIXI;WANG DIANFEN   

  • Published:1996-09-15

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采用离子减薄结合X射线光电子能谱方法原位对金属-陶瓷界面的电子结构进行研究, 其结果表明在界面处, 对Ti/Al~2O~3体系, 有氧化态的Ti, 同时发现部分的Al^3^+被还原; 对Ni/Al~2O~3体系, 在经退火处理后, 界面处Ni有多种结合态存在。本文结果与理论分析相一致, 对其它的实验结果给予了较好的解析。

关键词: 镍, 氧化铝, 钛, 电子结构, 光电子谱法, 其它基金, 金属-陶瓷界面

The electronic structure of Ti, Ni/Al~2O~3 interfaces were studied by X-ray photoelectron spectra (XPS) in situ during sputtering. The experiment results show that in the interface area, for Ti/Al~2O~3, Ti was oxidated and Al^3^+ was reduced; for Ni/Al~2O~3, Ni has several oxidation states including the spinel.

Key words: NICKEL, ALUMINIUM OXIDE, TITANIUM, ELECTRONIC STRUCTURE, PHOTOELECTRON SPECTROSCOPY

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