Adsorption and electrodeposition of metal ions on the surface of porous silicon

Acta Chimica Sinica ›› 1998, Vol. 56 ›› Issue (2): 171-177. Previous Articles Next Articles

Original Articles

金属离子在多孔硅表面和吸附与电镀过程中金属在多孔硅表面的淀积

王冠中;李鹏;马玉蓉;方容川;李凡庆

中国科学技术大学物理系;中国科学技术大学结构与成分分析中心

发布日期:1998-02-15

Adsorption and electrodeposition of metal ions on the surface of porous silicon

WANG GUANZHONG;LI PENG;MA YURONG;FANG RONGCHUAN;LI FANQING

Published:1998-02-15

Abstract

The effect of metal ions adsorption process on the native surface of porous silicon as-anodized is reported in this paper. The adsorption effect is discussed in term of the negative potential of native surface of porous silicon due to the hole depletion during anodization, and the negative potential vanishes as the sample is stored above one month. In the beginning of the electrodeposition process, the current density decreases with time under a certain voltage and the exponential relationship is explained in term of a simple model.

Key words: SILICON, ADSORPTION, ELECTROPLATING

CLC Number:

O647

Cite this article

WANG GUANZHONG;LI PENG;MA YURONG;FANG RONGCHUAN;LI FANQING. Adsorption and electrodeposition of metal ions on the surface of porous silicon[J]. Acta Chimica Sinica, 1998, 56(2): 171-177.

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金属离子在多孔硅表面和吸附与电镀过程中金属在多孔硅表面的淀积

Adsorption and electrodeposition of metal ions on the surface of porous silicon

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