有机化学 ›› 1993, Vol. 13 ›› Issue (3): 293-294. 上一篇    下一篇

研究论文

含噻吩基的三硅烷在辐照下的反应

吴世晖;钱虎;武戈;江南   

  1. 复旦大学化学系
  • 发布日期:1993-06-25

Reactions of thienyl containing trisilane under irradiation

WU SHIHUI;QIAN HU;WU GE;JIANG NAN   

  • Published:1993-06-25

通过类似的格氏反应合成了2-苯基-2-呋喃基六甲基三硅烷和2-苯基-2-噻吩基六甲基三硅烷.前者在2,3-二甲基-1,3-丁二烯存在时的光解导致正常的硅烯-烯烃加成和硅烯C-H插入反应.而噻吩基三硅烷在甲醇一环乙烷体系中被光解,产生自由基反应,我们怀疑噻吩中的硫原子对硅烷自由基有强烈的稳定作用.通过对典型的自由基反应产品的鉴定以及它的用自由基猝灭剂的猝灭产品的电子自旋共振谱也支持了这一结果.

关键词: 猝灭, 电子自旋共振谱法, 硅烷, 呋喃 P, 光解, 自由基反应, 加成反应, 噻吩 P, 插入反应

Photolysis of 2-phenyl-2-(2-thienyl)hexamethyltrisilane in MeOH/cyclohexene afforded radical reaction products. The sulfur atom of the thienyl group was suspected of stabilizing a silyl radical. The presence of trimethylsilyl(phenyl)(2-thienyl)silyl radical was supported by identification of its reaction products and by an ESR spectrum (no data) of its quenching product with 2-methyl-2-nitrosopropane.

Key words: FURAN P, QUENCHING, ELECTRON SPIN RESONANCE SPECTROMETRY, PHOTOLYSIS, SILANE, FREE RADICAL REACTION, ADDITION REACTION, INSERTION REACTION, THIOPHENE P

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