The present work describes the atomic absorption spectrophotometric analysis of silicon in various organosilicon compounds with nitrous oxide/acetylene flame. The combustion products were absorbed in a solution of sodium hydroxide and hydrogen peroxide, and then heated to 90`C in water bath for half an hour. After cooling its absorption value was determined. The standard addition method was used to overcome its matrix interferences. The efficiency of recovery of sodium silicate as a standard was 98.00 -- 102.5%. The concentration of sodium hydroxide may be 3 to 6N without effecting the result. The error was less than 0.5%.

Key words: SILICON, ATOMIC ABSORPTION SPECTROPHOTOMETRY, ORGANO SILICON COMPOUNDS